Contamination Control
Superior Sensitivity and Contamination Control of Trace Level Impurities
As the size of semiconductors in integrated circuits continues to shrink, the impacts of trace level contaminants, particularly metals, on manufacturing yields is growing. Only instruments such as Agilent's 8900 Triple Quadrupole ICP-MS and 7900 ICP-MS are able to provide the high levels of sensitivity needed to examine the purity, particulates and packaging of semiconductors effectively.
Our new generation of Ultimate Sensitivity technology is leading the way in contamination control, with the Cary 600 series FTIR and 4300 Handheld FTIR also enabling surface and shallow impurity detection. Our solutions enable the direct analysis of chemicals, eliminating dilution and sample contamination issues, and are supported by a comprehensive suite of sample handling, automation tools, and an unrivaled support structure for semiconductor users.
Trace elemental analysis of trichlorosilane by Agilent 7700s/7900 ICP-MS
- PDF/ Found In: Application Notes
- Date : 20 Sep 2021
- File Size : 427.44 KB
Direct analysis of trace metallic impurities in high purity hydrochloric acid by Agilent 7700s/7900 ICP-MS
- PDF/ Found In: Application Notes
- Date : 09 Oct 2017
- File Size : 446.89 KB
Direct measurement of metallic impurities in 20% ammonium hydroxide by Agilent 7700s/7900 ICP-MS
- PDF/ Found In: Application Notes
- Date : 09 Oct 2017
- File Size : 532.70 KB
- Application Notes
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Measuring the Optical Properties of Photovoltaic Cells Using the Cary 5000 UV-Vis-NIR Spectrophotometer and the External DRA-2500
Application note for measuring the optical properties of photovoltaic cells using the Cary 5000 UV-Vis-NIR spectrophotometer and the External DRA-2500.
- Application Notes
- English
- 18 Jan 2023
- 687.20 KB
Automated Analysis of Ultratrace Elemental Impurities in Isopropyl Alcohol
Online calibration using the IAS Automated Standard Addition System (ASAS)
- Application Notes
- English
- 07 Jun 2022
- 1.28 MB
Measuring Inorganic Impurities in Semiconductor Manufacturing
A guide to the applications of ICP-MS in the semiconductor industry, including the control of metal contaminants.
- Application Notes
- English
- 01 Jun 2022
- 6.68 MB
Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQ
Single-digit ppb detection limits for hydride gas contaminants using a single column, single injection volume, and multi-tune method
- Application Notes
- English
- 30 Sep 2020
- 498.77 KB
Analysis of Ultratrace Impurities in High Purity Copper using the Agilent 8900 ICP-QQQ
Low-ppt determination of alkali metals in high matrix samples using the optional "m-lens"
- Application Notes
- English
- 15 Nov 2018
- 934.66 KB
Automated Analysis of Semiconductor Grade Hydrogen Peroxide and DI Water using ICP-QQQ
Online MSA calibration using prepFAST S automated sample introduction and Agilent 8900 ICP-QQQ
- Application Notes
- English
- 06 Jun 2018
- 547.91 KB
Determination of trace elements in ultrapure semiconductor grade sulfuric acid using the Agilent 8900 ICP-QQQ in MS/MS mode
42 analytes in sulfuric acid, including Ti and other elements which are difficult to determine at trace levels in a high S matrix were successfully determined at ppt levels
- Application Notes
- English
- 06 Feb 2018
- 492.41 KB
Direct Analysis of Trace Metal Impurities in High Purity Nitric Acid Using ICP-QQQ
Direct analysis of sub-ppt to ppt levels of 49 elements in undiluted HNO3 by triple quadrupole ICP-MS (ICP-QQQ).
- Application Notes
- English
- 18 Jan 2018
- 691.40 KB
Analysis of Trace Metal Impurities in High Purity Hydrochloric Acid Using ICP-QQQ
50 elements in HCl were analysed using MS/MS mode to resolve the polyatomic interferences. All analytes could be determined directly in the undiluted HCl with single digit ppt detection limits.
- Application Notes
- English
- 09 Nov 2017
- 1.03 MB
Direct analysis of trace metallic impurities in high purity hydrochloric acid by Agilent 7700s/7900 ICP-MS
Illustrates the advanced analytical performance and robustness of the Agilent 7700s/7900 ICP-MS for the direct determination of metallic impurities in high purity concentrated HCl.
- Application Notes
- English
- 09 Oct 2017
- 446.89 KB
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7900 ICP-MS Video
- 00:02:40
- 17 Dec 2013