ICP-MS 高基质进样系统 (HMI) 附件
安捷伦高基质进样 (HMI) 技术作为 7800 ICP-MS 的标配提供，其采用创新的、由计算机控制且可重现的气溶胶稀释方法，可减少等离子体中气溶胶的载入量。因此，等离子体耐受的总溶解态固体 (TDS) 含量远高于 ICP-MS 可耐受的典型 TDS 含量范围 (0.1%-0.2%)。
HMI 使用洁净、干燥的氩气稀释样品气溶胶，完全避免了液体稀释的种种缺陷（时间成本、试剂成本、污染风险和稀释误差）。
HMI 使用洁净、干燥的氩气稀释样品气溶胶，完全避免了液体稀释的种种缺陷（时间成本、试剂成本、污染风险和稀释误差）。
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Product Details
Features
- 可直接分析含有低百分水平 TDS（最高 3%，取决于基质情况）的样品
- 与传统 ICP-MS 方法相比，显著提高了等离子体的稳定性
- 将氧化物干扰降至极低水平 (0.2% CeO/Ce)，提供更准确的结果和更稳定的取样条件
- 分析前无需对高基质样品进行液体稀释（常规的液体稀释存在一些缺点，包括增加了样品污染的风险、增大了稀释误差和延长了样品前处理时间）
- 作为 7800 ICP-MS 的标配提供
Literature
- Key Literature
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Plasma Robustness in ICP-MS: Benefits of a Low CeO/Ce Ratio
- Article Reprints
- English
- 13 Jun 2011
- 808.70 KB
High Throughput Analysis of Rock Digests using the 7700x with HMI and ISIS-DS
Geological exploration and mining generate tens of thousands of samples per week worldwide which must be analyzed quickly and accurately for a wide range of metals. By combining the High Matrix Introduction (HMI), which is standard on the Agilent 7700x ICP-MS, with Agilent’s Integrated Sample Introduction System for Discrete Sampling (ISIS-DS), previously unachievable throughput and stability can become routine. Sample throughput can be increased 4-fold while reducing the matrix load on the plasma and interface by more than 90% compared to conventional ICP-MS.
- Article Reprints
- English
- 01 Nov 2010
- 1022.71 KB
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