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稳定与干燥溶液

稳定与干燥溶液

RUO

安捷伦专有技术的稳定与干燥溶液经过优化,可降低扫描前微阵列芯片处理过程中臭氧对青色素 3 和青色素 5 的降解。在微阵列芯片处理区域中的臭氧水平高于 10 ppb 时应使用。
仅限研究使用。不可用于诊断目的。

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