Accurate, Reliable and Efficient Analysis of Ultrapure Water in Semiconductor Fabrication
Ensuring that contaminant levels of ultrapure water used in semiconductor fabrication processes remain as low as possible is an important challenge. Only precision analysis systems with the ability to detect trace impurities accurately and efficiently may be effectively used without significant impacts on manufacturing yields.
The Agilent 7900 ICP-MS and 8800 ICP-MS/MS systems provide reliable and reproducible analyses at the lowest detection levels. The instruments also feature a range of sample automation and data processing tools that enhance efficiency and enable cost-effective ultrapure water monitoring throughout silicon washing and other processes. All equipment is also backed up by Agilent's extensive and unrivalled support structure delivered by expert engineers.